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Proceedings Paper

Comparative study on PS material of EAPSM for flat panel display
Author(s): Jin-Woong Jeong; Jin-Han Song; Ho-Jin Lee; Kyu-Sik Kim; Woo-Gun Jeong; Young-Jin Yoon; Sang-Pil Yun; Sung-Mo Jung
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Paper Abstract

We evaluated and compared the i-line 5.2 % Cr based EAPSM and i-line 5.2 % MoSi based EAPSM to find more appropriate material of shifter for FPD. The evaluation items were their CD linearity, phase shift, and optical properties such as transmittance, reflectance, and absorbance under the wavelength range 200-800 nm. Finally, from the results, we performed simulations. The CD linearity and the phase shift were seen as the performances of the same level within all their specifications. The optical properties indicated that the transmittance was higher in the i-line 5.2 % Cr based EAPSM than in i-line 5.2 % MoSi based EAPSM from about 350 nm wavelength, and the reflectance was lower in the iline 5.2 % Cr based EAPSM than in i-line 5.2 % MoSi based EAPSM under the entire wavelength region. From these results, NILS and contrast were simulated between them in 5.0 μm pitch LS pattern and it was found that they did not have a significant difference. Side-lobe effect appeared in both EAPSMs when clear features were closely adjacent under 2.0 μm contact pattern. However, the side-lobe could be removed effectively by adopting Rim type EAPSM. The i-line 5.2 % MoSi based EAPSM may be more suitable for the Rim type EAPSM than the i-line 5.2 % Cr based EAPSM considering their structure and production process of the Rim type EAPSM. It may be appropriate that we use the i-line 5.2 % Cr based EAPSM in LS pattern and the i-line 5.2 % MoSi based EAPSM in contact pattern, because they were almost same level in that performance perspective.

Paper Details

Date Published: 4 October 2016
PDF: 10 pages
Proc. SPIE 9985, Photomask Technology 2016, 998512 (4 October 2016); doi: 10.1117/12.2241325
Show Author Affiliations
Jin-Woong Jeong, Photronics-PKL (Korea, Republic of)
Jin-Han Song, Photronics-PKL (Korea, Republic of)
Ho-Jin Lee, Photronics-PKL (Korea, Republic of)
Kyu-Sik Kim, Photronics-PKL (Korea, Republic of)
Woo-Gun Jeong, Photronics-PKL (Korea, Republic of)
Young-Jin Yoon, Photronics-PKL (Korea, Republic of)
Sang-Pil Yun, Photronics-PKL (Korea, Republic of)
Sung-Mo Jung, Photronics-PKL (Korea, Republic of)


Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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