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Proceedings Paper

Correction of deflection under mask’s own weight by bending mask technology
Author(s): Takashi Yagami; Takashi Kambayashi; Minako Azumi
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Paper Abstract

It is known that the photomask substrate deflects when the mask is set on the frame and the deflection is an obstacle to light exposure. In this study, we introduce “the bending mask” to cancel out the deflection. The surface of the bending mask has the height distribution in advance to cancel out the deflection, owing to Nikon’s accurate polishing technology and Nikon’s accurate measurement machine.

Paper Details

Date Published: 5 October 2016
PDF: 6 pages
Proc. SPIE 9985, Photomask Technology 2016, 99851X (5 October 2016); doi: 10.1117/12.2241153
Show Author Affiliations
Takashi Yagami, Nikon Corp. (Japan)
Takashi Kambayashi, Nikon Corp. (Japan)
Minako Azumi, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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