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Proceedings Paper

Influence of different developer nozzle types on the photomask performance
Author(s): Cindy Schmädicke; Axel Feicke; Mark Herrmann; Christian Bürgel
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Paper Abstract

The long-term development of electronics obliges increasingly tighter specifications for photomasks to meet the requirements of continuing miniaturization. We report on the influence of two different linear drive nozzle types A and B used for conducting the develop process on important mask properties, which comprise CD uniformity (CDU), loading behaviour, mean to target (MTT), iso-dense bias, line width roughness (LWR), linearity, resolution and defectivity. The results are presented for different resists, resist thicknesses and blank materials. First, the most important recipe parameters to ensure the best develop performance are defined and experimentally determined. Those critical factors are the nozzle scan speed over the mask, the develop time, the distance between nozzle and mask surface and the flow rate of the medium. It is demonstrated how these parameters can significantly affect the develop process performance. Dark loss experiments reveal that a more uniform resist removal takes place with the B kind of nozzle compared to that achieved with nozzle A. Based on the mask properties, the performances of two different nozzle types are compared. It is found that improvements with the B like nozzle can be achieved for CDU and loading. The presented nozzle type shows a promising approach to meet the requirements of future electronics.

Paper Details

Date Published: 10 May 2016
PDF: 6 pages
Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 998403 (10 May 2016); doi: 10.1117/12.2240859
Show Author Affiliations
Cindy Schmädicke, Advanced Mask Technology Ctr. (Germany)
Axel Feicke, Advanced Mask Technology Ctr. (Germany)
Mark Herrmann, Advanced Mask Technology Ctr. (Germany)
Christian Bürgel, Advanced Mask Technology Ctr. (Germany)


Published in SPIE Proceedings Vol. 9984:
Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
Nobuyuki Yoshioka, Editor(s)

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