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Proceedings Paper

Development of next-generation nanolithography methods to break the optical diffraction limit
Author(s): Huiwen Luo; Liang Wang; Jin Qin; Li Ding
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Paper Abstract

Photolithography has been one of the most important technologies in modern society, especially in semiconductor industry. However, due to the limitation of optical diffraction, this technique becomes more and more complex and expensive. In this paper, we experimentally study two promising techniques, near-field scanning optical lithography and nanoimprint lithography, which both have been proved to be alternatives to photolithography, and achieve sub-wavelength resolution. Taking advantage of bowtie apertures, near-field scanning optical lithography can achieve high resolution beyond the Rayleigh diffractive limit. Here, we report a novel method to fabricate bowtie aperture with sub-15 nm gap, producing highly confined electric near-field by localized surface plasmon (LSP) excitation and nanofocusing of the closely tapered gap, and obtain lithography results with 21 nm resolution (FWHM).We also develop a new plate-to-roll nanoimprint lithography (P2RNIL). Compared with plate-to-plate nanoimprint lithography (P2PNIL) and roll-to-plate nanoimprint lithography (R2PNIL), it avoids cylinder template fabrication in P2RNIL and significantly improves the productivity in P2PNIL. Our P2RNIL system can realize large-area nanoimprint continuously with high resolution and high speed.

Paper Details

Date Published: 31 October 2016
PDF: 8 pages
Proc. SPIE 10019, Optoelectronic Devices and Integration VI, 100190H (31 October 2016); doi: 10.1117/12.2240741
Show Author Affiliations
Huiwen Luo, Univ. of Science and Technology of China (China)
Liang Wang, Univ. of Science and Technology of China (China)
Jin Qin, Univ. of Science and Technology of China (China)
Li Ding, Univ. of Science and Technology of China (China)

Published in SPIE Proceedings Vol. 10019:
Optoelectronic Devices and Integration VI
Xuping Zhang; Baojun Li; Changyuan Yu, Editor(s)

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