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Proceedings Paper

Method of monitoring nonquarter-wavelength film thickness by turning point
Author(s): Anmin Zheng; Yixun Yan; Fengshan Zhang
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Paper Abstract

A method is presented for nionitoring Taultilayer structures with nonquarter wavelength thickness. This method is similar to the conventional turning point method, except that the irronitoring wavelength selected by adniittance diagram will be changed with layers. Results are given for the use of this method in depositing Antireflectance coatings (ARC.)

Paper Details

Date Published: 1 December 1990
PDF: 6 pages
Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); doi: 10.1117/12.22406
Show Author Affiliations
Anmin Zheng, Shanghai Institute of Technical Physics (United States)
Yixun Yan, Shanghai Institute of Technical Physics (China)
Fengshan Zhang, Shanghai Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 1323:
Optical Thin Films III: New Developments
Richard Ian Seddon, Editor(s)

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