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Proceedings Paper

Development of a high-energy Kirkpatrick Baez microscope
Author(s): Yaran Li; Baozhong Mu; Qing Xie; Xin Wang; Zhanshan Wang
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Paper Abstract

X-ray imaging of the laser produced plasma plays an important role in plasma diagnostics. Based on the urgent needs of conducting deeper and finer physical experiments, we developed a high-energy Kirkpatrick Baez microscope working at 17.48keV with a spectral resolution (E/▵E) of ~30. The concave spherical substrates was polished, ultrasonically cleaned and coated. The substrates have a radius of curvature of 20m with a roughness better than 0.3nm. The grazing incidence angles are designed at 0.7° and 0.73° for separate reflecting mirrors. The x-ray backlit imaging experiments show its spatial resolution is ~5.5μm at best focus. The effective field of view is measured to be ~90μm, which is consistent with the multilayer design. This article provides detailed informations for the optical design, multilayers coating and characterization of the microscope. The microscope promises to be a high-energy, high-resolution, and energy resolved X-ray diagnostics instrument for SG series laser facility.

Paper Details

Date Published: 15 September 2016
PDF: 5 pages
Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630J (15 September 2016); doi: 10.1117/12.2240109
Show Author Affiliations
Yaran Li, Tongji Univ. (China)
Baozhong Mu, Tongji Univ. (China)
Qing Xie, Tongji Univ. (China)
Xin Wang, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 9963:
Advances in X-Ray/EUV Optics and Components XI
Ali M. Khounsary; Shunji Goto; Christian Morawe, Editor(s)

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