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Proceedings Paper • Open Access

Aberration-free x-ray lenses made of silicon
Author(s): L. Alianelli; I. Pape; J. P. Sutter; O. J. L. Fox; K. J. S. Sawhney; K. Korwin-Mikke

Paper Abstract

Brilliant beams of hard x-rays, with geometrical cross-sections below 50×50 nm2, are a standard research tool for synchrotron users. With the advent of lower emittance sources, such as NSLSII, Petra III and Max IV, and planned upgraded lattices, such as APS-2, SPING8-II, ESRF II and DLS II, nanofocusing optics operating in transmission mode will become more competitive than they are currently. In general, they suffer from lower efficiency than reflective optics, however they often have easier set-up and alignment, combined with a smaller footprint. Fabrication and exploitation of ultra-short focal refractive lenses has not witnessed the same progress in the last decade as other optics, such as multilayer mirrors and multilayer Laue lenses. This paper reports on current status of high-resolution lithography for fabricating silicon lenses and on proposed designs for a new class of refractive lenses with zero aberrations and good efficiency. The new designs are created with geometrical parameters matching the spatial resolution achieved by modern lithography and silicon etch technology.

Paper Details

Date Published: 15 September 2016
PDF: 7 pages
Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630S (15 September 2016); doi: 10.1117/12.2240005
Show Author Affiliations
L. Alianelli, Diamond Light Source Ltd. (United Kingdom)
I. Pape, Diamond Light Source Ltd. (United Kingdom)
J. P. Sutter, Diamond Light Source Ltd. (United Kingdom)
O. J. L. Fox, Diamond Light Source Ltd. (United Kingdom)
K. J. S. Sawhney, Diamond Light Source Ltd. (United Kingdom)
K. Korwin-Mikke, Oxford Instruments Plasma Technology (United Kingdom)


Published in SPIE Proceedings Vol. 9963:
Advances in X-Ray/EUV Optics and Components XI
Ali M. Khounsary; Shunji Goto; Christian Morawe, Editor(s)

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