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Proceedings Paper

NXE pellicle: development update
Author(s): Derk Brouns; Aage Bendiksen; Par Broman; Eric Casimiri; Paul Colsters; Dennis de Graaf; Hilary Harrold; Piet Hennus; Paul Janssen; Ronald Kramer; Matthias Kruizinga; Henk Kuntzel; Raymond Lafarre; Andrea Mancuso; David Ockwell; Daniel Smith; David van de Weg; Jim Wiley
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Paper Abstract

ASML introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. We will present results of how we have taken the idea from concept to a demonstrated solution enabling the use of EUV pellicle by the industry for high volume manufacturing. We will update on the development of the next generation of pellicle films with higher power capability. Further, we will provide an update on top level requirements for pellicles and external interface requirements needed to support NXE pellicle adoption at a mask shop. Finally, we will present ASML’s pellicle handling equipment to enable pellicle use at mask shops and our NXE pellicle roadmap outlining future improvements.

Paper Details

Date Published: 26 September 2016
PDF: 7 pages
Proc. SPIE 9985, Photomask Technology 2016, 99850A (26 September 2016); doi: 10.1117/12.2239882
Show Author Affiliations
Derk Brouns, ASML Netherlands B.V. (Netherlands)
Aage Bendiksen, ASML (United States)
Par Broman, ASML Netherlands B.V. (Netherlands)
Eric Casimiri, ASML Netherlands B.V. (Netherlands)
Paul Colsters, ASML Netherlands B.V. (Netherlands)
Dennis de Graaf, ASML Netherlands B.V. (Netherlands)
Hilary Harrold, ASML (United States)
Piet Hennus, ASML Netherlands B.V. (Netherlands)
Paul Janssen, ASML Netherlands B.V. (Netherlands)
Ronald Kramer, ASML Netherlands B.V. (Netherlands)
Matthias Kruizinga, ASML Netherlands B.V. (Netherlands)
Henk Kuntzel, ASML Netherlands B.V. (Netherlands)
Raymond Lafarre, ASML Netherlands B.V. (Netherlands)
Andrea Mancuso, ASML Netherlands B.V. (Netherlands)
David Ockwell, ASML Netherlands B.V. (Netherlands)
Daniel Smith, ASML Netherlands B.V. (Netherlands)
David van de Weg, ASML Netherlands B.V. (Netherlands)
Jim Wiley, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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