Share Email Print

Proceedings Paper

Deformation of multilayers and optical surfaces in soft x-ray adaptive optics (Conference Presentation)
Author(s): Benjamin J. Wylie-van Eerd; Huiyu Yuan; Evert Houwman; Oleksandr Antonov; Eric Louis; Andrey E. Yakshin; Guus J. H. M. Rijnders; Fred Bijkerk
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Adaptive optics are of great utility in improving the resolving power of imaging and projection systems. In EUV lithography systems, for example, an adaptive optic can correct for wavefront deformation and decrease the feature size of integrated circuits that the system is in practice able to print. Piezoelectric thin films can be shown to accurately deform their surface with the sub-Angstrom precision required in order to compensate for wavefront deformation in EUV lithographic systems. However, in order to develop this from concept to working device, reflective coatings must be grown on top of the piezoelectric layer. Normal incidence EUV adaptive optics must meet the challenge of manipulating multilayer reflective coatings, while simultaneously preserving over many cycles the finely tuned structural properties that result in high XUV reflectivity. At this moment there are many unanswered questions in the literature about the behavior of an EUV multilayer under strain and the interaction of piezoelectric elements with multilayers. In this talk, we will present modelling of the response of multilayers to inhomogeneous strains that may be expected in a normal-incidence EUV adaptive optic, and preliminary experimental results.

Paper Details

Date Published: 2 November 2016
PDF: 1 pages
Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630N (2 November 2016); doi: 10.1117/12.2239018
Show Author Affiliations
Benjamin J. Wylie-van Eerd, Univ. Twente (Netherlands)
Huiyu Yuan, Univ. Twente (Netherlands)
Evert Houwman, Univ. Twente (Netherlands)
Oleksandr Antonov, Univ. Twente (Netherlands)
Eric Louis, Univ. Twente (Netherlands)
Andrey E. Yakshin, Univ. Twente (Netherlands)
Guus J. H. M. Rijnders, Univ. Twente (Netherlands)
Fred Bijkerk, Univ. Twente (Netherlands)

Published in SPIE Proceedings Vol. 9963:
Advances in X-Ray/EUV Optics and Components XI
Ali M. Khounsary; Shunji Goto; Christian Morawe, Editor(s)

© SPIE. Terms of Use
Back to Top