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Proceedings Paper

Developing an EUV multilayer adaptive mirror: the first results
Author(s): Alain Jody Corso; Stefano Bonora; Paola Zuppella; Peter Baksh; Magdalena Miszczak; William Brocklesby; Zhanshan Wang; Piergiorgio Nicolosi; Maria Guglielmina Pelizzo
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Paper Abstract

The growing interest in the study of the extreme ultraviolet (EUV) radiation-matter interaction is feeding up the development of new technologies able to overcame some current technological limits. Adaptive optics is an established technology already widely used for wavefront correction in many applications such as astronomical telescopes, laser communications, high power laser systems, microscopy and high resolution imaging systems. Although this technology is already exploited in the EUV and X-ray range, its usage is only feasible in systems with a grazing incidence configuration. On the other hand, the development of a EUV normal incidence adaptive optics can open new interesting possibilities in many different fields ranging from free electron laser and synchrotron applications up to EUV photolithography. In this work we report the preliminary results achieved in the developing of a normal incidence EUV multilayered adaptive mirror tuned at 30.4nm. The proper functioning and potential applications of such device have been demonstrated by using a High order Harmonics Generation (HHG) source.

Paper Details

Date Published: 15 September 2016
PDF: 7 pages
Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630K (15 September 2016); doi: 10.1117/12.2238541
Show Author Affiliations
Alain Jody Corso, Institute for Photonics and Nanotechnologies - National Research Council (Italy)
Stefano Bonora, Institute for Photonics and Nanotechnologies - National Research Council (Italy)
Paola Zuppella, Institute for Photonics and Nanotechnologies - National Research Council (Italy)
Peter Baksh, Univ. of Southampton (United Kingdom)
Magdalena Miszczak, Univ. of Southampton (United Kingdom)
William Brocklesby, Univ. of Southampton (United Kingdom)
Zhanshan Wang, Tongji Univ. (China)
Piergiorgio Nicolosi, Institute for Photonics and Nanotechnologies - National Research Council (Italy)
Univ. of Padova (Italy)
Maria Guglielmina Pelizzo, Institute for Photonics and Nanotechnologies - National Research Council (Italy)


Published in SPIE Proceedings Vol. 9963:
Advances in X-Ray/EUV Optics and Components XI
Ali M. Khounsary; Shunji Goto; Christian Morawe, Editor(s)

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Developing an EUV multilayer adaptive mirror: the first results



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