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Proceedings Paper

CsI:Tl scintillator separated by Si grid partition wall
Author(s): Kento Tabata; Junichi Nishizawa; Akihumi Koike; Toru Aoki
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Paper Abstract

The spatial resolution of scintillator type imaging detector is not so high because diffusion of luminescence in the scintillator. As a countermeasure, the silicon substrate was processed to make a small grid by MEMS technique for optical separation of scintillator. The silicon grid wall can completely obtain optical-separation for visible light as a result of X-ray scintillation. Moreover, we can get large-size silicon wafers up to diameter of 30cm with high precision semiconductor process. In this paper, the purpose is to fill a scintillator material such as CsI:Tl, inside of the grid substrate. Because the aspect ratio of the grid is large (90μm x 90μm with 800μm depth), it is not easy to fill scintillator inside the grid. Moreover, it is necessary to ensure uniformity, intention of light emission. In this study, the CsI:Tl was filled inside of the grid by resistive heated evaporation method. We evaluated by X-ray luminescence and test chart.

Paper Details

Date Published: 30 September 2016
PDF: 7 pages
Proc. SPIE 9968, Hard X-Ray, Gamma-Ray, and Neutron Detector Physics XVIII, 99681H (30 September 2016); doi: 10.1117/12.2238424
Show Author Affiliations
Kento Tabata, Shizuoka Univ. (Japan)
Junichi Nishizawa, Shizuoka Univ. (Japan)
Akihumi Koike, ANSeeN Inc. (Japan)
Toru Aoki, Shizuoka Univ. (Japan)

Published in SPIE Proceedings Vol. 9968:
Hard X-Ray, Gamma-Ray, and Neutron Detector Physics XVIII
Ralph B. James; Michael Fiederle; Arnold Burger; Larry Franks, Editor(s)

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