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Proceedings Paper

Plasma-enhanced atomic layer deposition for plasmonic TiN
Author(s): Lauren M. Otto; Aaron T. Hammack; Shaul Aloni; D. Frank Ogletree; Deirdre L. Olynick; Scott Dhuey; Bethanie J. H. Stadler; Adam M. Schwartzberg
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Paper Abstract

This work presents the low temperature plasma-enhanced atomic layer deposition (PE-ALD) of TiN, a promising plasmonic synthetic metal. The plasmonics community has immediate needs for alternatives to traditional plasmonic materials (e.g. Ag and Au), which lack chemical, thermal, and mechanical stability. Plasmonic alloys and synthetic metals have significantly improved stability, but their growth can require high-temperatures (>400 °C), and it is difficult to control the thickness and directionality of the resulting film, especially on technologically important substrates. Such issues prevent the application of alternative plasmonic materials for both fundamental studies and large-scale industrial applications. Alternatively, PE-ALD allows for conformal deposition on a variety of substrates with consistent material properties. This conformal coating will allow the creation of exotic three-dimensional structures, and low-temperature deposition techniques will provide unrestricted usage across a variety of platforms. The characterization of this new plasmonic material was performed with in-situ spectroscopic ellipsometry as well as Auger electron spectroscopy for analysis of TiN film sensitivity to oxide cross-contamination. Plasmonic TiN films were fabricated, and a chlorine plasma etch was found to pattern two dimensional gratings as a test structure. Optical measurements of 900 nm period gratings showed reasonable agreement with theoretical modeling of the fabricated structures, indicating that ellipsometry models of the TiN were indeed accurate.

Paper Details

Date Published: 3 October 2016
PDF: 8 pages
Proc. SPIE 9919, Nanophotonic Materials XIII, 99190N (3 October 2016); doi: 10.1117/12.2238340
Show Author Affiliations
Lauren M. Otto, Univ. of Minnesota, Twin Cities (United States)
Lawrence Berkeley National Lab. (United States)
Aaron T. Hammack, Lawrence Berkeley National Lab. (United States)
Shaul Aloni, Lawrence Berkeley National Lab. (United States)
D. Frank Ogletree, Lawrence Berkeley National Lab. (United States)
Deirdre L. Olynick, Lawrence Berkeley National Lab. (United States)
Scott Dhuey, Lawrence Berkeley National Lab. (United States)
Bethanie J. H. Stadler, Univ. of Minnesota, Twin Cities (United States)
Adam M. Schwartzberg, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 9919:
Nanophotonic Materials XIII
Stefano Cabrini; Gilles Lérondel; Adam M. Schwartzberg; Taleb Mokari, Editor(s)

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