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Proceedings Paper

Characterizing environmental effects on visible and UV reflectance of ALD-coated optics
Author(s): Christian Carter; Christopher Samuel Moore; John Hennessy; April D. Jewell; Shouleh Nikzad; Kevin France
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Paper Abstract

Numerous atomic and molecular transitions that provide important diagnostics for astrophysical research exist in the Lyman-ultraviolet (LUV; 91.2 - 121.6 nm) and far-ultraviolet (FUV; 121.6 - 200 nm) bandpasses. Future astronomy and planetary science missions require the development of mirror coatings with improved reflectance between 90 - 200 nm which maintain optical performance in visible and IR wavelengths (320 - 2000 nm). Towards this end, we have developed an atomic layer deposition (ALD) process for optical coatings to enhance the efficiency of future space observatories. We measured the reflectance from 115-826 nm of sample optics, consisting of silicon wafers coated with lithium fluoride films deposited via ALD. We also measured the reflectance of sample optics stored in various environments, and characterized the effect of storage environment on visible and UV optical performance over week-long time scales. Minimal change in optical performance was observed for wavelengths between 200 and 800 nm, regardless of storage environment.

Paper Details

Date Published: 17 October 2016
PDF: 8 pages
Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630V (17 October 2016); doi: 10.1117/12.2238198
Show Author Affiliations
Christian Carter, Univ. of Colorado Boulder (United States)
Christopher Samuel Moore, Univ. of Colorado Boulder (United States)
John Hennessy, Jet Propulsion Lab. (United States)
April D. Jewell, Jet Propulsion Lab. (United States)
Shouleh Nikzad, Jet Propulsion Lab. (United States)
Kevin France, Univ. of Colorado Boulder (United States)


Published in SPIE Proceedings Vol. 9963:
Advances in X-Ray/EUV Optics and Components XI
Ali M. Khounsary; Shunji Goto; Christian Morawe, Editor(s)

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