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Proceedings Paper

ZnO top-down structuring for UV photonic applications (Conference Presentation)
Author(s): Komla D. Nomenyo; Clotaire Chevalier-César; Anna Rumyantseva; Anisha Gokarna; Agnieszka Gwiazda; Gilles Lérondel

Paper Abstract

ZnO is a promising II-VI semiconductor for UV applications although p-type ZnO is not yet available. Nevertheless it remains an alternative material for GaN and its alloy InGaN. For example, the exciton binding energy of ZnO (60 meV) is higher than that of GaN (21 meV). This allows ZnO to emit light at ambient temperature and interestingly, it increases the device brightness. Besides promising intrinsic properties, light-matter control and especially in the UV relies on the ability of material nanostructuring. We present here two different kinds of top-down process in order to nanostructure ZnO. The first one relies on Electron Beam Lithography (EBL) combined with a lift-off process and inductively coupled plasma (ICP) reactive ion etching (RIE). Nickel (Ni) has been used as a mask in order to have a high selectivity in the presence of C2F6 and O2 ionized gases. The etching rate used was 26nm/s in order to avoid roughness. The second process is called Direct Holographic Patterning (DHP). ZnO thin films have been holographicaly patterned for the first time by direct photodissolution in NaCl solution using laser interference lithography. Application of an electrical potential strongly increases the dissolution rate and decreases the pattern formation time. Both processes will be discussed in terms of their respective potential for light confinement in the UV.

Paper Details

Date Published: 3 November 2016
PDF: 1 pages
Proc. SPIE 9926, UV and Higher Energy Photonics: From Materials to Applications, 99260U (3 November 2016); doi: 10.1117/12.2238154
Show Author Affiliations
Komla D. Nomenyo, Univ. de Technologie Troyes (France)
Clotaire Chevalier-César, Univ. de Technologie Troyes (France)
Anna Rumyantseva, Univ. de Technologie Troyes (France)
Anisha Gokarna, Univ. de Technologie Troyes (France)
Agnieszka Gwiazda, Univ. de Technologie Troyes (France)
Gilles Lérondel, Univ. de Technologie Troyes (France)


Published in SPIE Proceedings Vol. 9926:
UV and Higher Energy Photonics: From Materials to Applications
Gilles Lérondel; Satoshi Kawata; Yong-Hoon Cho, Editor(s)

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