Share Email Print
cover

Proceedings Paper • new

Cleaning procedure for improved photothermal background of toroidal optical microresonators
Author(s): Erik H. Horak; Kassandra A. Knapper; Kevin D. Heylman; Randall H. Goldsmith
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

High Q-factors and small mode volumes have made toroidal optical microresonators exquisite sensors to small shifts in the effective refractive index of the WGM modes. Eliminating contaminants and improving quality factors is key for many different sensing techniques, and is particularly important for photothermal imaging as contaminants add photothermal background obscuring objects of interest. Several different cleaning procedures including wet- and dry-chemical procedures are tested for their effect on Q-factors and photothermal background. RCA cleaning was shown to be successful in contrast to previously described acid cleaning procedures, most likely due to the different surface reactivity of the acid reagents used. UV-ozone cleaning was shown to be vastly superior to O2 plasma cleaning procedures, significantly reducing the photothermal background of the resonator.

Paper Details

Date Published: 26 September 2016
PDF: 6 pages
Proc. SPIE 9923, Physical Chemistry of Interfaces and Nanomaterials XV, 99230Z (26 September 2016); doi: 10.1117/12.2238001
Show Author Affiliations
Erik H. Horak, Univ. of Wisconsin-Madison (United States)
Kassandra A. Knapper, Univ. of Wisconsin-Madison (United States)
Kevin D. Heylman, Univ. of Wisconsin-Madison (United States)
Randall H. Goldsmith, Univ. of Wisconsin-Madison (United States)


Published in SPIE Proceedings Vol. 9923:
Physical Chemistry of Interfaces and Nanomaterials XV
Artem A. Bakulin; Robert Lovrincic; Natalie Banerji, Editor(s)

© SPIE. Terms of Use
Back to Top