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Proceedings Paper

Plasma-enhanced CVD hard coatings for opthalmic optics
Author(s): Werner Klug; Roland Schneider; Alfons Zoeller
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Paper Abstract

To protect the soft surface of organic CR 39 ophthalmic lenses we built up a parallel plate reactor and developed a Plasma Enhanced Chemical Vapor Deposition (PECVD) process for Si02 protection films. Beside high transmission in the VIS-range we obtained refractive indices between n=1.46 and n=l.49 depending on the process parameters at layer- thicknesses of 2,5 jnn to 5 jmt. Deposition rates up to 30 A/s and thickness uniformities of 10 % were achieved. The mechanical properties of these layers were tested with different methodes and gave better results compared with other technologies like ion-assisted deposition or lacquering.

Paper Details

Date Published: 1 December 1990
PDF: 10 pages
Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); doi: 10.1117/12.22376
Show Author Affiliations
Werner Klug, Leybold AG (Germany)
Roland Schneider, Leybold AG (Germany)
Alfons Zoeller, Leybold AG (Germany)

Published in SPIE Proceedings Vol. 1323:
Optical Thin Films III: New Developments
Richard Ian Seddon, Editor(s)

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