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Uniformity of LED light illumination in application to direct imaging lithography
Author(s): Ting-Ming Huang; Shenq-Tsong Chang; Ho-Lin Tsay; Ming-Ying Hsu; Fong-Zhi Chen
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Paper Abstract

Direct imaging has widely applied in lithography for a long time because of its simplicity and easy-maintenance. Although this method has limitation of lithography resolution, it is still adopted in industries. Uniformity of UV irradiance for a designed area is an important requirement. While mercury lamps were used as the light source in the early stage, LEDs have drawn a lot of attention for consideration from several aspects. Although LED has better and better performance, arrays of LEDs are required to obtain desired irradiance because of limitation of brightness for a single LED. Several effects are considered that affect the uniformity of UV irradiance such as alignment of optics, temperature of each LED, performance of each LED due to production uniformity, and pointing of LED module. Effects of these factors are considered to study the uniformity of LED Light Illumination. Numerical analysis is performed by assuming a serious of control factors to have a better understanding of each factor.

Paper Details

Date Published: 7 September 2016
PDF: 8 pages
Proc. SPIE 9954, Fifteenth International Conference on Solid State Lighting and LED-based Illumination Systems, 99540Q (7 September 2016); doi: 10.1117/12.2237441
Show Author Affiliations
Ting-Ming Huang, Instrument Technology Research Ctr. (Taiwan)
Shenq-Tsong Chang, Instrument Technology Research Ctr. (Taiwan)
Ho-Lin Tsay, Instrument Technology Research Ctr. (Taiwan)
Ming-Ying Hsu, Instrument Technology Research Ctr (Taiwan)
Fong-Zhi Chen, Instrument Technology Research Ctr. (Taiwan)


Published in SPIE Proceedings Vol. 9954:
Fifteenth International Conference on Solid State Lighting and LED-based Illumination Systems
Matthew H. Kane; Nikolaus Dietz; Ian T. Ferguson, Editor(s)

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