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Array imaging system for lithography
Author(s): Raoul Kirner; Kevin Mueller; Pauline Malaurie; Uwe Vogler; Wilfried Noell; Toralf Scharf; Reinhard Voelkel
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Paper Abstract

We present an integrated array imaging system based on a stack of microlens arrays. The microlens arrays are manufactured by melting resist and reactive ion etching (RIE) technology on 8’’ wafers (fused silica) and mounted by wafer-level packaging (WLP)1. The array imaging system is configured for 1X projection (magnification m = +1) of a mask pattern onto a planar wafer. The optical system is based on two symmetric telescopes, thus anti-symmetric wavefront aberrations like coma, distortion, lateral color are minimal. Spherical aberrations are reduced by using microlenses with aspherical lens profiles. In our system design approach, sub-images of individual imaging channels do not overlap to avoid interference. Image superposition is achieved by moving the array imaging system during the exposure time. A tandem Koehler integrator illumination system (MO Exposure Optics) is used for illumination. The angular spectrum of the illumination light underfills the pupils of the imaging channels to avoid crosstalk. We present and discuss results from simulation, mounting and testing of a first prototype of the investigated array imaging system for lithography.

Paper Details

Date Published: 27 September 2016
PDF: 11 pages
Proc. SPIE 9951, Optical System Alignment, Tolerancing, and Verification X, 99510A (27 September 2016); doi: 10.1117/12.2237339
Show Author Affiliations
Raoul Kirner, SUSS MicroOptics SA (Switzerland)
Kevin Mueller, SUSS MicroOptics SA (Switzerland)
Pauline Malaurie, SUSS MicroOptics SA (Switzerland)
Uwe Vogler, SUSS MicroTec Photonic Systems Inc. (United States)
Wilfried Noell, SUSS MicroOptics SA (Switzerland)
Toralf Scharf, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)


Published in SPIE Proceedings Vol. 9951:
Optical System Alignment, Tolerancing, and Verification X
José Sasián; Richard N. Youngworth, Editor(s)

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Array imaging system for lithography



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