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Proceedings Paper

Radio frequency and microwave plasma for optical thin-film deposition
Author(s): Juergen Otto; Volker Paquet; Ralf Th. Kersten; Heinz-Werner Etzkorn; Raymond M. Brusasco; Jerald A. Britten; Jack H. Campbell; J. B. Thorsness
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Paper Abstract

For the next generation of fusion lasers reflecting mirrors with laser damage thresholds of at least 40 J/cm2 for 1 0 ns laser pulses at 1 .064 pm are needed. Up to now, no deposition technique has been developed to produce such mirrors. Best R&D-values realized today are around 30 J/cm2 for e-beam evaporated mirrors. R&D on conventional e-beam coating processes over the last 1 0 years has come up with marginal improvements in laser damage thresholds only. However, new technologies, like PICVD (Plasma-Impulse CVD) developed for the fabrication of ultra-low loss fiber preforms, seem to offer the potential to solve this problem. First results have been reported already [1-3]. It is well known that fused silica produced by CVD processes can have laser damage thresholds as high as 80 J/cm2. However, the thickness of a single deposited film is in the pm-range for most of the CVD-processes used for preform manufacturing; since interference optics need films in the ; /4n range (where n is the refractive index of the dielectric material) the use of preform-fabrication processes for the purpose of interference mirror fabrication is limited to a few plasma based CVD technologies, namely PCVD (Plasma-CVD, Philips [4]; PICVD, SCHOTT [5]). Especially PICVD is a very powerful technology to fabricate thin film multilayers for interference mirrors, because this technique is able to produce films down to monolayer thickness with nearly perfect stoichiometry and morphology. In first and preliminary experiments the usual deposition in a circular tube at high temperatures has been used for simplicity. However, to produce large area high quality laser mirrors this principle know-how has to be transfered from circular to planar geometry. Experiments showed, that there may be some limitations with respect to the homogeneity of a planar deposition using microwave excitation for the plasma. Therefore experiments have been performed in parallel with both RF and microwave excitation for comparison. In the following we will restrict ourselves to the description and discussions of the planar processes; the principle and details of the PICVD-process are described elsewhere [5] while RF-plasma technology is a well known process.

Paper Details

Date Published: 1 December 1990
PDF: 12 pages
Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); doi: 10.1117/12.22371
Show Author Affiliations
Juergen Otto, Schott Glaswerke (Germany)
Volker Paquet, Schott Glaswerke (Germany)
Ralf Th. Kersten, Schott Glaswerke (Germany)
Heinz-Werner Etzkorn, Schott Glaswerke (Germany)
Raymond M. Brusasco, Lawrence Livermore National Lab. (United States)
Jerald A. Britten, Lawrence Livermore National Lab. (United States)
Jack H. Campbell, Lawrence Livermore National Lab. (United States)
J. B. Thorsness, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 1323:
Optical Thin Films III: New Developments
Richard Ian Seddon, Editor(s)

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