Share Email Print
cover

Proceedings Paper • new

Laser stabilization in atom lithography based on LIF signal from the chromium beam
Author(s): Tong Zhang; Yuejin Zhao; Cong Yin
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Atom lithography has now become an important means for manufacturing Nano-scale gratings, which are indispensable instruments for Nano-scale dimensional metrology. However, the presence of laser frequency drift makes the results unsatisfactory. Using the atoms’ laser induced fluorescence (LIF) to stabilize the laser frequency provides an effective method of overcoming the drift. This paper gives an analysis with regard to our own experimentation conditions in some aspects, such as fluorescence of Cr beam, difference signal, the correlation between laser frequency and the central of fluorescence. Based on the analysis, the laser induced fluorescence frequency stabilizing equipment is built in our selfdesigned system of chromium atom lithography. The laser is detuned near the wavelength of the 7S37P40 transition of 52Cr, so that the atom beam could be illuminated. The power of the laser we used is 15mW. The position of the fluorescent spot depends on detune of the laser. This spot is imaged onto a split- photodiode. Whenever the laser frequency exhibits some deviations from the desired value, the difference signal between the right and the left area of the detector is non-zero. The measured signal is used to servo-lock the laser. It is acquired by the servo-lock port of the Ti:sapphire laser. As a result, the laser frequency is stabilized in the wavelength corresponding to 7S37P40 transition of 52Cr. The stability is superior

Paper Details

Date Published: 29 September 2016
PDF: 8 pages
Proc. SPIE 9948, Novel Optical Systems Design and Optimization XIX, 99480S (29 September 2016); doi: 10.1117/12.2237099
Show Author Affiliations
Tong Zhang, Beijing Institute of Technology (China)
Yuejin Zhao, Beijing Institute of Technology (China)
Cong Yin, National Institute of Metrology (China)


Published in SPIE Proceedings Vol. 9948:
Novel Optical Systems Design and Optimization XIX
Arthur J. Davis; Cornelius F. Hahlweg; Joseph R. Mulley, Editor(s)

Video Presentation

Laser stabilization in atom lithography based on LIF signal from the chromium beam



© SPIE. Terms of Use
Back to Top