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Moire interferometry patterns for rotational alignment of structures
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Paper Abstract

In some manufacturing applications the alignment of fine structures formed on the surface of a part such as micro-scribed patterns on solar panels can be critical to the panel performance. Variations in pattern uniformity may degrade the efficiency of the solar panel if the pattern deviates significantly from designed parameters. This paper will explore the use of moire patterns to interpret the angular alignment of such structures on 3 dimensional non-planar shapes. The moire interferometry pattern creates a beat between the scribed pattern and a reference pattern that is a function of both the shape of the part as well as the shape of the scribed pattern. Both the part shape variations and the patterns of interest are typically much smaller than can be seen visually. Similar challenges exist when inspecting specular models or testing low quality optics. The moire effect allows small displacements to be measured from patterns that are well below the resolution of the camera systems that are used to view the patterns. Issues such as the separation of the shape of the part from the alignment of the fine structure as well as resolution and robustness of the technique will be explored in this paper.

Paper Details

Date Published: 28 August 2016
PDF: 11 pages
Proc. SPIE 9960, Interferometry XVIII, 99600J (28 August 2016); doi: 10.1117/12.2237032
Show Author Affiliations
Esmaeil Heidari, GE Global Research Ctr. (United States)
Kevin Harding, GE Global Research Ctr. (United States)


Published in SPIE Proceedings Vol. 9960:
Interferometry XVIII
Katherine Creath; Jan Burke; Armando Albertazzi Gonçalves, Editor(s)

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