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Proceedings Paper

Fabrication and characterization of one-dimensional multilayer gratings for nanoscale microscope calibration
Author(s): Xingrui Wang; Yang Zhao; Jie Liu; Jie Chen; Tongbao Li; Xinbin Cheng
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Paper Abstract

One-dimensional multilayer gratings were prepared by four steps. A periodic Si/SiO2 multilayer was firstly deposited on Si substrate using a magnetron sputtering coating process. Then, the multilayer was been bonded and split into small pieces by diamond wire cutting. The side-wall of the cut sample was subsequently grinded and polished until the surface roughness was less than 1nm. Finally, the SiO2 layers were selective etched using hydrofluoric acid to form the grating structure. In the above steps, special attentions were given to optimize the etching processes to achieve a uniform and smooth grating pattern. Transmission electron microscope (TEM) was used to characterize the multilayer gratings. The pitch size of the grating was evaluated by an offline image analysis algorithm and optimized processes are discussed.

Paper Details

Date Published: 15 September 2016
PDF: 7 pages
Proc. SPIE 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII, 99270M (15 September 2016); doi: 10.1117/12.2236866
Show Author Affiliations
Xingrui Wang, Tongji Univ. (China)
Yang Zhao, Tongji Univ. (China)
Jie Liu, Tongji Univ. (China)
Jie Chen, Tongji Univ. (China)
Tongbao Li, Tongji Univ. (China)
Xinbin Cheng, Tongji Univ. (China)

Published in SPIE Proceedings Vol. 9927:
Nanoengineering: Fabrication, Properties, Optics, and Devices XIII
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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