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Proceedings Paper

Destructive and constructive routes to prepare nanostructures on surfaces by low-energy ion beam sputtering
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Paper Abstract

Various approaches for the preparation of nanostructures with dimension on macroscopic areas are known. In contrast to cost-intensive top-down lithographic techniques, various bottom-up methods based on ion beam technologies to form large arrays of nanostructured surfaces are well established. In principle, it can be distinguished between two routes at the preparation of nanostructures by low-energy ion bombardment sputtering.

The destructive route is characterized that under certain conditions, given by the self-organization processes, the ion beam induced erosion process can lead to the formation of e.g. well-ordered Si nanostructures like dots or ripples on the surface. Using a constructive route, i.e. glancing angle deposition by ion beam sputtering, sculptured thin films consisting of various nanostructures of several shapes, such as inclined and vertical columns, screws, and spirals, were deposited on Si substrates. It will be shown that morphology, shape, and diameter of the structures are influenced and can thus be controlled by adjusting various deposition parameters, including substrate temperature and ratio of substrate rotational speed to film deposition rate.

Paper Details

Date Published: 3 October 2016
PDF: 8 pages
Proc. SPIE 9929, Nanostructured Thin Films IX, 99290A (3 October 2016); doi: 10.1117/12.2236472
Show Author Affiliations
Bernd Rauschenbach, Leibniz Institute of Surface Modification (Germany)
Univ. Leipzig (Germany)
Frank Frost, Leibniz Institute of Surface Modification (Germany)

Published in SPIE Proceedings Vol. 9929:
Nanostructured Thin Films IX
Akhlesh Lakhtakia; Tom G. Mackay; Motofumi Suzuki, Editor(s)

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