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Proceedings Paper

Plasmonic lens lithography far beyond the near field diffraction limit: a promising way for nano fabrications
Author(s): Changtao Wang; Ze Yu Zhao; Ping Gao; Yunfei Luo; Ling Liu; Kaipeng Liu; Xiangang Luo; Xiong Li
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Proc. SPIE 9921, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XIV, 99210O; doi: 10.1117/12.2236332
Show Author Affiliations
Changtao Wang, Institute of Optics and Electronics (China)
Ze Yu Zhao, Institute of Optics and Electronics (China)
Ping Gao, Institute of Optics and Electronics (China)
Yunfei Luo, Institute of Optics and Electronics (China)
Ling Liu, Institute of Optics and Electronics (China)
Kaipeng Liu, Institute of Optics and Electronics (China)
Xiangang Luo, Institute of Optics and Electronics (China)
Xiong Li, Institute of Optics and Electronics, CAS (China)


Published in SPIE Proceedings Vol. 9921:
Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XIV
Satoshi Kawata; Din Ping Tsai, Editor(s)

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