Share Email Print
cover

Proceedings Paper

Cliché fabrication method using precise roll printing process with 5 um pattern width
Author(s): Yejin Shin; Inyoung Kim; Dong-Ho Oh; Taik-Min Lee
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Among the printing processes for printed electronic devices, gravure offset and reverse offset method have drawn attention for its fine pattern printing possibility. These printing methods use cliché, which has critical effect on the final product precision and quality. In this research, a novel precise cliché replica method is proposed. It consists of copper sputtering, precise mask pattern printing with 5 um width using reverse offset printing, Ni electroplating, lift-off, etching, and DLC coating. We finally compare the fabricated replica cliché with the original one and print out precise patterns using the replica cliché.

Paper Details

Date Published: 15 September 2016
PDF: 5 pages
Proc. SPIE 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII, 99271M (15 September 2016); doi: 10.1117/12.2235730
Show Author Affiliations
Yejin Shin, Korea Institute of Machinery & Materials (Korea, Republic of)
Chungnam National Univ. (Korea, Republic of)
Inyoung Kim, Korea Institute of Machinery & Materials (Korea, Republic of)
Dong-Ho Oh, Chungnam National Univ. (Korea, Republic of)
Taik-Min Lee, Korea Institute of Machinery & Materials (Korea, Republic of)


Published in SPIE Proceedings Vol. 9927:
Nanoengineering: Fabrication, Properties, Optics, and Devices XIII
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

© SPIE. Terms of Use
Back to Top