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Proceedings Paper

Approaching perfection in the manufacturing of silicon immersion gratings
Author(s): Benjamin T. Kidder; Cynthia B. Brooks; Michelle M. Grigas; Daniel T. Jaffe
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Paper Abstract

Silicon immersion gratings make near-IR spectrographs compact and allow them to have continuous wavelength coverage over a large bandwidth. We have produced an exceptional silicon immersion grating that approaches optical perfection in terms of surface error. This grating has a peak-to-valley error of 79 nm over a 25 mm beam, which exceeds the 85 nm requirement to have λ/4 peak-to-valley error at the shortest wavelength where silicon immersion gratings can be used. In order to reduce the level of large-scale errors we have honed our contact printing method by optimizing our UV exposure system, introducing additional process checks and inspections and carefully evaluating large-scale errors in the gratings produced.

Paper Details

Date Published: 22 July 2016
PDF: 7 pages
Proc. SPIE 9912, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation II, 99123L (22 July 2016); doi: 10.1117/12.2233321
Show Author Affiliations
Benjamin T. Kidder, The Univ. of Texas at Austin (United States)
Cynthia B. Brooks, The Univ. of Texas at Austin (United States)
Michelle M. Grigas, The Univ. of Texas at Austin (United States)
Daniel T. Jaffe, The Univ. of Texas at Austin (United States)


Published in SPIE Proceedings Vol. 9912:
Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation II
Ramón Navarro; James H. Burge, Editor(s)

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