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Proceedings Paper

New lithographic techniques for x-ray spectroscopy
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Paper Abstract

Off-plane reflection gratings require high-fidelity, custom groove profiles to perform with high spectral resolution in a Wolter-I optical system. This places a premium on exploring lithographic techniques in nanofabrication to produce state-of-the-art gratings. The fabrication recipe currently being pursued involves electron-beam lithography (EBL) and reactive ion etching (RIE) to define the groove profile, wet anisotropic etching in silicon to achieve blazed grooves and UV-nanoimprint lithography (UV-NIL) to replicate the final product. A process involving grayscale EBL and thermal reflow known as thermally activated selective topography equilibration (TASTE) is also being investigated as an alternative method to fabricate these gratings. However, a master grating fabricated entirely in soft polymeric resist through the TASTE process requires imprinting procedures other than UV-NIL to explored. A commerically available process called substrate conformal imprint lithography (SCIL) has been identified as a possible solution to this problem. SCIL also has the ability to replicate etched silicon gratings with reduced trapped air defects as compared to UV-NIL, where it is difficult to achieve conformal contact over large areas. As a result, SCIL has the potential to replace UV-NIL in the current grating fabrication recipe.

Paper Details

Date Published: 27 July 2016
PDF: 10 pages
Proc. SPIE 9905, Space Telescopes and Instrumentation 2016: Ultraviolet to Gamma Ray, 990524 (27 July 2016); doi: 10.1117/12.2232072
Show Author Affiliations
Jake McCoy, Pennsylvania State Univ. (United States)
Randall McEntaffer, Pennsylvania State Univ. (United States)
Casey DeRoo, Harvard-Smithsonian Ctr. for Astrophysics (United States)


Published in SPIE Proceedings Vol. 9905:
Space Telescopes and Instrumentation 2016: Ultraviolet to Gamma Ray
Jan-Willem A. den Herder; Tadayuki Takahashi; Marshall Bautz, Editor(s)

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