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Proceedings Paper

Sensing roughness and polish direction
Author(s): M. L. Jakobsen; A. S. Olesen; H. E. Larsen; J. Stubager; S. G. Hanson; T. F. Pedersen; H. C. Pedersen
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Paper Abstract

As a part of the work carried out on a project supported by the Danish council for technology and innovation, we have investigated the option of smoothing standard CNC machined surfaces. In the process of constructing optical prototypes, involving custom-designed optics, the development cost and time consumption can become relatively large numbers in a research budget. Machining the optical surfaces directly is expensive and time consuming. Alternatively, a more standardized and cheaper machining method can be used, but then the object needs to be manually polished. During the polishing process the operator needs information about the RMS-value of the surface roughness and the current direction of the scratches introduces by the polishing process. The RMS-value indicates to the operator how far he is from the final finish, and the scratch orientation is often specified by the customer in order to avoid complications during the casting process.

In this work we present a method for measuring the RMS-values of the surface roughness while simultaneously determining the polishing direction. We are mainly interested in the RMS-values in the range from 0 – 100 nm, which corresponds to the finish categories of A1, A2 and A3. Based on simple intensity measurements we estimates the RMS-value of the surface roughness, and by using a sectioned annual photo-detector to collect the scattered light we can determine the direction of polishing and distinguish light scattered from random structures and light scattered from scratches.

Paper Details

Date Published: 26 April 2016
PDF: 8 pages
Proc. SPIE 9890, Optical Micro- and Nanometrology VI, 98900S (26 April 2016); doi: 10.1117/12.2229440
Show Author Affiliations
M. L. Jakobsen, Technical Univ. of Denmark (Denmark)
A. S. Olesen, Technical Univ. of Denmark (Denmark)
H. E. Larsen, Technical Univ. of Denmark (Denmark)
J. Stubager, Technical Univ. of Denmark (Denmark)
S. G. Hanson, Technical Univ. of Denmark (Denmark)
T. F. Pedersen, Force Technology (Denmark)
H. C. Pedersen, Technical Univ. of Denmark (Denmark)


Published in SPIE Proceedings Vol. 9890:
Optical Micro- and Nanometrology VI
Christophe Gorecki; Anand Krishna Asundi; Wolfgang Osten, Editor(s)

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