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Proceedings Paper

Structural parameters and polarization properties of TiN thin films prepared by reactive magnetron sputtering
Author(s): M. M. Solovan; V. V. Brus; L. J. Pidkamin; P. D. Maryanchuk; Yu. G. Dobrovolsky
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Paper Abstract

We report the results of the investigation of morphological, structural, optical and plarimeteric properties of titanium nitride thin films deposited on silicon and glass substrates.

The magnetron sputtered titanium nitride thin films were established to possess crystalline structure with the average grain size about D = 15 nm.

The method of correlation matrix is was applied for the analysis of polarization properties of scattered light by the titanium nitride thin film. The obtained experimental result, can be explained by the presence of the effects of linear and circular dichroism in the material of the titanium nitride thin films under investigations.

Paper Details

Date Published: 30 November 2015
PDF: 8 pages
Proc. SPIE 9809, Twelfth International Conference on Correlation Optics, 980910 (30 November 2015); doi: 10.1117/12.2228981
Show Author Affiliations
M. M. Solovan, Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)
V. V. Brus, Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)
L. J. Pidkamin, Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)
P. D. Maryanchuk, Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)
Yu. G. Dobrovolsky, Tensor (Ukraine)


Published in SPIE Proceedings Vol. 9809:
Twelfth International Conference on Correlation Optics
Oleg V. Angelsky, Editor(s)

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