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Proceedings Paper

Fabrication process of Si microlenses for OCT systems
Author(s): A. Jovic; G. Pandraud; K. Zinoviev; J. L. Rubio; E. Margallo; P. M. Sarro
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Paper Abstract

We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.

Paper Details

Date Published: 27 April 2016
PDF: 10 pages
Proc. SPIE 9888, Micro-Optics 2016, 98880C (27 April 2016); doi: 10.1117/12.2227898
Show Author Affiliations
A. Jovic, Technische Univ. Delft (Netherlands)
G. Pandraud, Technische Univ. Delft (Netherlands)
K. Zinoviev, MedLumics S.L. (Spain)
J. L. Rubio, MedLumics S.L. (Spain)
E. Margallo, MedLumics S.L. (Spain)
P. M. Sarro, Technische Univ. Delft (Netherlands)


Published in SPIE Proceedings Vol. 9888:
Micro-Optics 2016
Hugo Thienpont; Jürgen Mohr; Hans Zappe; Hirochika Nakajima, Editor(s)

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