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Proceedings Paper

Hybrid pattern matching based SRAF placement
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Paper Abstract

A hybrid multi-step method for Sub-Resolution Assist Feature (SRAF) placement is presented. The process window, characterized by process variation bands (PV-bands), is subjected to optimization. By applying a state-of-the-art advanced pattern matching based approach, the SRAF placement is optimized to maximize the process window. Due to the complexity of building a complete Rule-Based SRAF (RBSRAF) solution and the performance limitation of the Model-Based SRAF solution (MBSRAF), the hybrid pattern based SRAF reduces the complexity and improves performance. In this paper, the hybrid pattern-based SRAF algorithm and its implementation, as well as testing results, are discussed with respect to process window and performance.

Paper Details

Date Published: 16 March 2016
PDF: 8 pages
Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 978117 (16 March 2016); doi: 10.1117/12.2225830
Show Author Affiliations
Ahmed Omran, GLOBALFOUNDRIES Inc. (United States)
Andrey Lutich, GLOBALFOUNDRIES Dresden (Germany)
Uwe Paul Schroeder, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 9781:
Design-Process-Technology Co-optimization for Manufacturability X
Luigi Capodieci, Editor(s)

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