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Proceedings Paper

Accurate characterization of mask defects by combination of phase retrieval and deterministic approach
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Paper Abstract

In this paper, we present a method to characterize not only shape but also depth of defects in line and space mask patterns. Features in a mask are too fine for conventional imaging system to resolve them and coherent imaging system providing only the pattern diffracted by the mask are used. Then, phase retrieval methods may be applied, but the accuracy it too low to determine the exact shape of the defect. Deterministic methods have been proposed to characterize accurately the defect, but it requires a reference pattern. We propose to use successively phase retrieval algorithm to retrieve the general shape of the mask and then deterministic approach to characterize precisely the defects detected.

Paper Details

Date Published: 1 June 2016
PDF: 8 pages
Proc. SPIE 9867, Three-Dimensional Imaging, Visualization, and Display 2016, 986712 (1 June 2016); doi: 10.1117/12.2224712
Show Author Affiliations
Min-Chul Park, Korea Univ. of Science and Technology (Korea, Republic of)
Korea Institute of Science and Technology (Korea, Republic of)
Thibault Leportier, Korea Univ. of Science and Technology (Korea, Republic of)
Korea Institute of Science and Technology (Korea, Republic of)
Wooshik Kim, Sejong Univ. (Korea, Republic of)
Jindong Song, Korea Institute of Science and Technology (Korea, Republic of)


Published in SPIE Proceedings Vol. 9867:
Three-Dimensional Imaging, Visualization, and Display 2016
Bahram Javidi; Jung-Young Son, Editor(s)

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