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Proceedings Paper

The development of thin film metrology by coherence scanning interferometry
Author(s): Hirokazu Yoshino; Roger Smith; John M. Walls; Daniel Mansfield
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Paper Abstract

Scanning White Light Interferometry (SWLI), now referred to as Coherence Scanning Interferometry (CSI), is established as a powerful tool for sub-nanometer surface metrology. The technique provides accurate and rapid three dimensional topographical analysis without contacting the surface under measurement. This paper will focus on recent developments of CSI using the Helical Complex Field (HCF) function that have extended its use for important thin film measurements. These developments now enable CSI to perform thin film thickness measurements, to measure the surface profile and the interfacial surface roughness of a buried interface and to derive optical constants (index of refraction n and extinction coefficient K).

Paper Details

Date Published: 27 February 2016
PDF: 14 pages
Proc. SPIE 9749, Oxide-based Materials and Devices VII, 97490P (27 February 2016); doi: 10.1117/12.2222883
Show Author Affiliations
Hirokazu Yoshino, Loughborough Univ. (United Kingdom)
Roger Smith, Loughborough Univ. (United Kingdom)
John M. Walls, Loughborough Univ. (United Kingdom)
Daniel Mansfield, Taylor Hobson Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 9749:
Oxide-based Materials and Devices VII
Ferechteh H. Teherani; David C. Look; David J. Rogers, Editor(s)

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