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Proceedings Paper

Advancements in predictive plasma formation modeling
Author(s): Michael A. Purvis; Alexander Schafgans; Daniel J. W. Brown; Igor Fomenkov; Rob Rafac; Josh Brown; Yezheng Tao; Slava Rokitski; Mathew Abraham; Mike Vargas; Spencer Rich; Ted Taylor; David Brandt; Alberto Pirati; Aaron Fisher; Howard Scott; Alice Koniges; David Eder; Scott Wilks; Anthony Link; Steven Langer
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Paper Abstract

We present highlights from plasma simulations performed in collaboration with Lawrence Livermore National Labs. This modeling is performed to advance the rate of learning about optimal EUV generation for laser produced plasmas and to provide insights where experimental results are not currently available. The goal is to identify key physical processes necessary for an accurate and predictive model capable of simulating a wide range of conditions. This modeling will help to drive source performance scaling in support of the EUV Lithography roadmap. The model simulates pre-pulse laser interaction with the tin droplet and follows the droplet expansion into the main pulse target zone. Next, the interaction of the expanded droplet with the main laser pulse is simulated. We demonstrate the predictive nature of the code and provide comparison with experimental results.

Paper Details

Date Published: 18 March 2016
PDF: 12 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97760K (18 March 2016); doi: 10.1117/12.2221991
Show Author Affiliations
Michael A. Purvis, Cymer LLC (United States)
Alexander Schafgans, Cymer LLC (United States)
Daniel J. W. Brown, Cymer LLC (United States)
Igor Fomenkov, Cymer LLC (United States)
Rob Rafac, Cymer, LLC (United States)
Josh Brown, Cymer LLC (United States)
Yezheng Tao, Cymer LLC (United States)
Slava Rokitski, Cymer LLC (United States)
Mathew Abraham, Cymer LLC (United States)
Mike Vargas, Cymer LLC (United States)
Spencer Rich, Cymer LLC (United States)
Ted Taylor, Cymer LLC (United States)
David Brandt, Cymer LLC (United States)
Alberto Pirati, ASML Netherlands B.V. (Netherlands)
Aaron Fisher, Lawrence Livermore National Lab. (United States)
Howard Scott, Lawrence Livermore National Lab. (United States)
Alice Koniges, Lawrence Berkeley National Lab. (United States)
David Eder, Lawrence Livermore National Lab. (United States)
Scott Wilks, Lawrence Livermore National Lab. (United States)
Anthony Link, Lawrence Livermore National Lab. (United States)
Steven Langer, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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