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Proceedings Paper

Analytical analysis of adaptive defect detection in amplitude and phase structures using photorefractive four-wave mixing
Author(s): George Nehmetallah; John Donoghue; Partha Banerjee; Jed Khoury; Michiharu Yamamoto; Nasser Peyghambarian
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Paper Abstract

In this work, brief theoretical modeling, analysis, and novel numerical verification of a photorefractive polymer based four wave mixing (FWM) setup for defect detection has been developed. The numerical simulation helps to validate our earlier experimental results to perform defect detection in periodic amplitude and phase objects using FWM. Specifically, we develop the theory behind the detection of isolated defects, and random defects in amplitude, and phase periodic patterns. In accordance with the developed theory, the results show that this technique successfully detects the slightest defects through band-pass intensity filtering and requires minimal additional post image processing contrast enhancement. This optical defect detection technique can be applied to the detection of production line defects, e.g., scratch enhancement, defect cluster enhancement, and periodic pattern dislocation enhancement. This technique is very useful in quality control systems, production line defect inspection, and computer vision.

Paper Details

Date Published: 20 April 2016
PDF: 7 pages
Proc. SPIE 9845, Optical Pattern Recognition XXVII, 98450Q (20 April 2016); doi: 10.1117/12.2221911
Show Author Affiliations
George Nehmetallah, The Catholic Univ. of America (United States)
John Donoghue, Solid State Scientific Corp. (United States)
Partha Banerjee, Univ. of Dayton (United States)
Jed Khoury, Air Force Research Lab. (United States)
Michiharu Yamamoto, Nitto Denko Technical Corp. Lab. (United States)
Nasser Peyghambarian, College of Optical Sciences, The Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 9845:
Optical Pattern Recognition XXVII
David Casasent; Mohammad S. Alam, Editor(s)

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