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Proceedings Paper

NXE pellicle: offering a EUV pellicle solution to the industry
Author(s): Derk Brouns; Aage Bendiksen; Par Broman; Eric Casimiri; Paul Colsters; Peter Delmastro; Dennis de Graaf; Paul Janssen; Mark van de Kerkhof; Ronald Kramer; Matthias Kruizinga; Henk Kuntzel; Frits van der Meulen; David Ockwell; Maria Peter; Daniel Smith; Beatrijs Verbrugge; David van de Weg; Jim Wiley; Noelie Wojewoda; Carmen Zoldesi; Pieter van Zwol
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Paper Abstract

Towards the end of 2014, ASML committed to provide a EUV pellicle solution to the industry. Last year, during SPIE Microlithography 2015, we introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. This paper shows results of how we took this concept to a complete EUV pellicle solution for the industry. We will highlight some technical design challenges we faced developing the NXE pellicle and how we solved them. We will also present imaging results of pellicle exposures on a 0.33 NA NXE scanner system. In conjunction with the NXE pellicle, we will also present the supporting tooling we have developed to enable pellicle use.

Paper Details

Date Published: 18 March 2016
PDF: 10 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761Y (18 March 2016); doi: 10.1117/12.2221909
Show Author Affiliations
Derk Brouns, ASML Netherlands B.V. (Netherlands)
Aage Bendiksen, ASML (United States)
Par Broman, ASML Netherlands B.V. (Netherlands)
Eric Casimiri, ASML Netherlands B.V. (Netherlands)
Paul Colsters, ASML Netherlands B.V. (Netherlands)
Peter Delmastro, ASML (United States)
Dennis de Graaf, ASML Netherlands B.V. (Netherlands)
Paul Janssen, ASML Netherlands B.V. (Netherlands)
Mark van de Kerkhof, ASML Netherlands B.V. (Netherlands)
Ronald Kramer, ASML Netherlands B.V. (Netherlands)
Matthias Kruizinga, ASML Netherlands B.V. (Netherlands)
Henk Kuntzel, ASML Netherlands B.V. (Netherlands)
Frits van der Meulen, ASML Netherlands B.V. (Netherlands)
David Ockwell, ASML Netherlands B.V. (Netherlands)
Maria Peter, ASML Netherlands B.V. (Netherlands)
Daniel Smith, ASML Netherlands B.V. (Netherlands)
Beatrijs Verbrugge, ASML Netherlands B.V. (Netherlands)
David van de Weg, ASML Netherlands B.V. (Netherlands)
Jim Wiley, ASML US, Inc. (United States)
Noelie Wojewoda, ASML Netherlands B.V. (Netherlands)
Carmen Zoldesi, ASML Netherlands B.V. (Netherlands)
Pieter van Zwol, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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