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Proceedings Paper

High chi block copolymers based on chemical modification of poly(t-butyl acrylate) containing block copolymers
Author(s): Sungmin Park; Seongjun Jo; Yonghoon Lee; Chang Y. Ryu; Du Yeol Ryu; Jun Sung Chun
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Paper Abstract

We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been chemically modified to a fluorinated block for the enhancement of the BCP χ-parameters. dPSb- PtBA had been first synthesized by anionic polymerization to prepare a well-defined BCP precursor with narrow polydispersity for the fluorination of PtBA block. Then, the precursor BCP was chemically modified by transalcoholysis of the PtBA-block with 2,2,2-trifluoroethanol. This strategy offers the advantage of flexibility and controllability to tailor the χ-parameter, while maintaining the narrow molecular weight distribution of the BCP materials for the advanced lithography applications. The transmission electron microscopy/small angle x-ray scattering (TEM/SAXS) characterization results of the modified BCP consisting of poly(fluoroalkylate) and PS supported the development of highly ordered lamellar domains in bulk.

Paper Details

Date Published: 11 April 2016
PDF: 7 pages
Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977911 (11 April 2016); doi: 10.1117/12.2221905
Show Author Affiliations
Sungmin Park, Yonsei Univ. (Korea, Republic of)
Seongjun Jo, Yonsei Univ. (Korea, Republic of)
Yonghoon Lee, Yonsei Univ. (Korea, Republic of)
Chang Y. Ryu, Rensselaer Polytechnic Institute (United States)
Du Yeol Ryu, Yonsei Univ. (Korea, Republic of)
Jun Sung Chun, SUNY Polytechnic Institute at Albany (United States)

Published in SPIE Proceedings Vol. 9779:
Advances in Patterning Materials and Processes XXXIII
Christoph K. Hohle; Rick Uchida, Editor(s)

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