Share Email Print
cover

Proceedings Paper

Directed self-assembly materials for high resolution beyond PS-b-PMMA
Author(s): Eri Hirahara; Margareta Paunescu; Orest Polishchuk; EunJeong Jeong; Edward Ng; Jianhui Shan; Jian Yin; Jihoon Kim; Yi Cao; Jin Li; SungEun Hong; Durairaj Baskaran; Guanyang Lin
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

To extend directed self-assembly (DSA) of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) for higher resolution, placement accuracy and potentially improved pattern line edge roughness (LER), we have developed a next-generation material platform of organic high-χ block copolymers (“HC series”, AZEMBLYTM EXP PME-3000 series). The new material platform has a built-in orientation control mechanism which enables block copolymer domains to vertically selforient without topcoat/additive or delicate solvent vapor annealing. Furthermore, sub-10 nm lines and spaces (L/S) patterning by two major chemoepitaxy DSA, LiNe and SMARTTM processes, was successfully implemented on 12” wafer substrates by using the PME-3000 lamellar series. The results revealed that the new material platform is compatible with the existing PS-b-PMMA-based chemical prepatterns and standard protocols. We also introduced the built-in orientation control strategy to the conventional PS-b-PMMA system, producing a new generation of PS-b-PMMA materials with facile orientation control. The modified PS-b-PMMA (m-PS-b-PMMA) performed LiNe flow DSA yielding a comparable CD process window with improved LER/LWR/SWR after the L/S patterns were transferred into a Si substrate.

Paper Details

Date Published: 25 March 2016
PDF: 11 pages
Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977914 (25 March 2016); doi: 10.1117/12.2220424
Show Author Affiliations
Eri Hirahara, EMD Performance Materials Corp. (United States)
Margareta Paunescu, EMD Performance Materials Corp. (United States)
Orest Polishchuk, EMD Performance Materials Corp. (United States)
EunJeong Jeong, EMD Performance Materials Corp. (United States)
Edward Ng, EMD Performance Materials Corp. (United States)
Jianhui Shan, EMD Performance Materials Corp. (United States)
Jian Yin, EMD Performance Materials Corp. (United States)
Jihoon Kim, EMD Performance Materials Corp. (United States)
Yi Cao, EMD Performance Materials Corp. (United States)
Jin Li, EMD Performance Materials Corp. (United States)
SungEun Hong, EMD Performance Materials Corp. (United States)
Durairaj Baskaran, EMD Performance Materials Corp. (United States)
Guanyang Lin, EMD Performance Materials Corp. (United States)


Published in SPIE Proceedings Vol. 9779:
Advances in Patterning Materials and Processes XXXIII
Christoph K. Hohle; Rick Uchida, Editor(s)

© SPIE. Terms of Use
Back to Top