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Proceedings Paper

Multiple beam ptychography
Author(s): Robert Karl; Charles Bevis; Raymond Lopez-Rios; Jonathan Reichanadter; Dennis F. Gardner; Christina Porter; Elisabeth Shanblatt; Michael Tanksalvala; Giulia F. Mancini; Margaret Murnane; Henry Kapteyn; Daniel Adams
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Paper Abstract

We present an extension to ptychography that allows simultaneous deconvolution of multiple, spatially separate, illuminating probes. This enables an increased field of view and hence, an increase in imaging throughput, without increased exposure times. This technique can be used for any non-interfering probes: demonstrated with multiple wavelengths and orthogonal polarizations. The latter of which gives us spatially resolved polarization spectroscopy from a single scan.

Paper Details

Date Published: 21 April 2016
PDF: 6 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780F (21 April 2016); doi: 10.1117/12.2220416
Show Author Affiliations
Robert Karl, Univ. of Colorado Boulder (United States)
Charles Bevis, Univ. of Colorado Boulder (United States)
Raymond Lopez-Rios, Univ. of Rochester (United States)
Jonathan Reichanadter, Univ. of Colorado Boulder (United States)
Dennis F. Gardner, Univ. of Colorado Boulder (United States)
Christina Porter, Univ. of Colorado Boulder (United States)
Elisabeth Shanblatt, Univ. of Colorado Boulder (United States)
Michael Tanksalvala, Univ. of Colorado Boulder (United States)
Giulia F. Mancini, Univ. of Colorado Boulder (United States)
Margaret Murnane, Univ. of Colorado Boulder (United States)
Henry Kapteyn, Univ. of Colorado Boulder (United States)
Daniel Adams, Univ. of Colorado Boulder (United States)


Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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