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Proceedings Paper

Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle
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Paper Abstract

The absorption of extreme-ultraviolet (EUV) pellicle could be the most critical problem because the EUV source power is still not good enough for achieving mass production. We found that the transmission loss due to the EUV pellicle could be compensated through proper optical proximity correction (OPC) of a pellicled mask. Patterning results of OPCed masks with different transmission pellicles are shown for various 1D and 2D patterns. From the results, it is clearly shown that we do not need to increase the dose to avoid the throughput loss even if a pellicle which has 80 % one-pass transmission is used. Therefore, the EUV pellicle manufacturing would be much easier because we can use much thicker film with higher absorption.

Paper Details

Date Published: 18 March 2016
PDF: 9 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97760I (18 March 2016); doi: 10.1117/12.2220155
Show Author Affiliations
Ki-Ho Ko, Hanyang Univ. (Korea, Republic of)
Soo-Yeon Mo, Hanyang Univ. (Korea, Republic of)
In-Seon Kim, Hanyang Univ. (Korea, Republic of)
Hye-Keun Oh, Hanyang Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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