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Proceedings Paper

Study of Gd/Tb LPP emission near λ = 6.7nm for beyond EUV lithography
Author(s): Liang Yin; Hanchen Wang; Brendan Reagan; Cory Baumgarten; Vyacheslav Shlyaptsev; Eric Gullikson; Jorge Rocca
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Paper Abstract

Plasmas emitting near λ=6.7nm are of interest for beyond EUV lithography (BEUVL). We have conducted a comprehensive study of the spectral characteristics, conversion efficiency, and source size of Gd and Tb laser-produced plasmas over a broad range of laser pulsewidths (120ps-4ns) and irradiation intensities (1.4×1011-6.1×1013W/cm2). The data over the entire parameter range was acquired using a single diode-pumped Yb: YAG laser. The angular distribution of the BEUV emission was measured using an array of calibrated energy-monitors, allowing for an accurate estimate of the BEUV yield. A similar conversion efficiency of 0.47% into a 0.6% bandwidth in 2π solid angle was measured for both Gd and Tb plasma.

Paper Details

Date Published: 18 March 2016
PDF: 7 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761M (18 March 2016); doi: 10.1117/12.2219840
Show Author Affiliations
Liang Yin, Colorado State Univ. (United States)
Hanchen Wang, Colorado State Univ. (United States)
Brendan Reagan, Colorado State Univ. (United States)
Cory Baumgarten, Colorado State Univ. (United States)
Vyacheslav Shlyaptsev, Colorado State Univ. (United States)
Eric Gullikson, Lawrence Berkeley National Lab. (United States)
Jorge Rocca, Colorado State Univ. (United States)


Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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