Share Email Print
cover

Proceedings Paper

An automated image-based tool for pupil plane characterization of EUVL tools
Author(s): Zac Levinson; Jack S. Smith; Germain Fenger; Bruce W. Smith
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Pupil plane characterization will play a critical role in image process optimization for EUV lithography (EUVL), as it has for several lithography generations. In EUVL systems there is additional importance placed on understanding the ways that thermally-induced system drift affect pupil variation during operation. In-situ full pupil characterization is therefore essential for these tools. To this end we have developed Quick Inverse Pupil (QUIP)—a software suite developed for rapid characterization of pupil plane behavior based on images formed by that system. The software consists of three main components: 1) an image viewer, 2) the model builder, and 3) the wavefront analyzer. The image viewer analyzes CDSEM micrographs or actinic mask micrographs to measure either CDs or through-focus intensity volumes. The software is capable of rotation correction and image registration with subpixel accuracy. The second component pre-builds a model for a particular imaging system to enable rapid pupil characterization. Finally, the third component analyzes the results from the image viewer and uses the optional pre-built model for inverse solutions of pupil plane behavior. Both pupil amplitude and phase variation can be extracted using this software. Inverse solutions are obtained through a model based algorithm which is built on top of commercial rigorous full-vector simulation software.

Paper Details

Date Published: 18 March 2016
PDF: 6 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97762M (18 March 2016); doi: 10.1117/12.2219704
Show Author Affiliations
Zac Levinson, Rochester Institute of Technology (United States)
Jack S. Smith, Rochester Institute of Technology (United States)
Germain Fenger, Mentor Graphics Corp. (Belgium)
Bruce W. Smith, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

© SPIE. Terms of Use
Back to Top