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The reaction mechanism and patterning of photosensitized chemically amplified resists
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Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977611; doi: 10.1117/12.2219553
Show Author Affiliations
Seiichi Tagawa, Osaka Univ. (Japan)
Akihiro Oshima, Osaka Univ. (Japan)
Cong Que Dinh, Osaka Univ. (Japan)
Shigehiro Nishijima, Osaka Univ. (Japan)
Seiji nagahara, Tokyo Electron Ltd. (Japan)
Michael Carcasi, Tokyo Electron America, Inc. (United States)
Gosuke Shiraishi, Tokyo Electron Kyushu Ltd. (Japan)
Yuichi Terashita, Tokyo Electron Kyushu Ltd. (Japan)
Yukie Minekawa, Tokyo Electron Kyushu Ltd. (Japan)
Kosuke Yoshihara, Tokyo Electron Kyushu Ltd. (Japan)
Hisashi Nakagawa, JSR Corp. (Japan)
Takehiko Naruoka, JSR Corp. (Japan)
Tomoki Nagai, JSR Corp. (Japan)


Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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