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Proceedings Paper

Deep-UV interference lithography combined with masked contact lithography for pixel wiregrid patterns
Author(s): David Lombardo; Piyush Shah; Pengfei Guo; Andrew Sarangan
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Paper Abstract

Pixelated wiregrids are of great interest in polarimetric imagers, but there are no straightforward methods available for combining the uniform exposures of laser interference with a masking system to achieve pixels at different rotational angles. In this work we demonstrate a 266nm deep-UV interference lithography combined with a traditional i-line contact lithography to create such pixels. Aluminum wiregrids are first made, following by etching to create the pixels, and then a planarizing molybdenum film is used before patterning subsequent pixel arrays. The etch contrast between the molybdenum and the aluminum enables the release of the planarizing layer.

Paper Details

Date Published: 1 April 2016
PDF: 6 pages
Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771N (1 April 2016); doi: 10.1117/12.2219484
Show Author Affiliations
David Lombardo, Univ. of Dayton (United States)
Piyush Shah, Univ. of Dayton (United States)
Pengfei Guo, Univ. of Dayton (United States)
Andrew Sarangan, Univ. of Dayton (United States)


Published in SPIE Proceedings Vol. 9777:
Alternative Lithographic Technologies VIII
Christopher Bencher, Editor(s)

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