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Proceedings Paper

Model based OPC/ORC accounting for non-planar topography effects in implant layer
Author(s): Taehyeong Lee
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Paper Details

Date Published:
Proc. SPIE 9780, Optical Microlithography XXIX, 97801D; doi: 10.1117/12.2219469
Show Author Affiliations
Taehyeong Lee, SK Hynix, Inc. (Korea, Republic of)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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