Share Email Print
cover

Proceedings Paper

Model based OPC/ORC accounting for non-planar topography effects in implant layer
Author(s): Taehyeong Lee
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published:
PDF
Proc. SPIE 9780, Optical Microlithography XXIX, 97801D; doi: 10.1117/12.2219469
Show Author Affiliations
Taehyeong Lee, SK Hynix, Inc. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

© SPIE. Terms of Use
Back to Top