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Proceedings Paper

Reliable characterization of materials and nanostructured systems <<50nm using coherent EUV beams
Author(s): Jorge Hernandez-Charpak; Travis Frazer; Joshua Knobloch; Kathleen Hoogeboom-Pot; Damiano Nardi; Weilun Chao; Lei Jiang; Marie Tripp; Sean King; Henry Kapteyn; Margaret Murnane
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Paper Abstract

Coherent extreme ultraviolet beams from tabletop high harmonic generation offer revolutionary capabilities for observing nanoscale systems on their intrinsic length and time scales. By launching and monitoring acoustic waves in such systems, we fully characterize sub-10nm films and find that the Poisson’s ratio of low-k dielectric materials does not stay constant as often assumed, but increases when bond coordination is bellow a critical value. Within the same measurement, by following the heat dissipation dynamics from nano-gratings of width 20-1000nm and different periodicities, we confirm the effects of the newly identified collectively-diffusive regime, where close-spaced nanowires cool faster than widely-spaced ones.

Paper Details

Date Published: 21 April 2016
PDF: 8 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780I (21 April 2016); doi: 10.1117/12.2219434
Show Author Affiliations
Jorge Hernandez-Charpak, Univ. of Colorado Boulder (United States)
NIST (United States)
Travis Frazer, Univ. of Colorado Boulder (United States)
NIST (United States)
Joshua Knobloch, Univ. of Colorado Boulder (United States)
NIST (United States)
Kathleen Hoogeboom-Pot, Univ. of Colorado Boulder (United States)
NIST (United States)
Damiano Nardi, Univ. of Colorado Boulder (United States)
NIST (United States)
Weilun Chao, Lawrence Berkeley National Lab. (United States)
Lei Jiang, Intel Corp. (United States)
Marie Tripp, Intel Corp. (United States)
Sean King, Intel Corp. (United States)
Henry Kapteyn, Univ. of Colorado Boulder (United States)
NIST (United States)
Margaret Murnane, Univ. of Colorado Boulder (United States)
NIST (United States)


Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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