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Proceedings Paper

Impact of pulse-to-pulse stability on CD resolution for next generation inspection tools using VUV or EUV laser produced plasma light sources
Author(s): Alexander F. R. Sanders; Bob Rollinger; Nadia Gambino; Jose Barros; Reza S. Abhari
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Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781P; doi: 10.1117/12.2219339
Show Author Affiliations
Alexander F. R. Sanders, ETH Zürich (Switzerland)
Bob Rollinger, ETH Zürich (Switzerland)
Nadia Gambino, ETH Zürich (Switzerland)
Jose Barros, ETH Zürich (Switzerland)
Reza S. Abhari, ETH Zürich (Switzerland)


Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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