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Proceedings Paper

Modeling ellipsometric measurement of novel 3D structures with RCWA and FEM simulations
Author(s): Samuel O'Mullane; Nick Keller; Alain C. Diebold
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Paper Abstract

Using rigorous coupled wave analysis (RCWA) and finite element method (FEM) simulations together, many interesting ellipsometric measurements can be investigated. This work specifically focuses on simulating copper grating structures that are plasmonically active. Looking at near-field images and Mueller matrix spectra, understanding of physical phenomena is possible. A general strategy for combatting convergence difficulties in RCWA simulations is proposed and applied. The example used is a copper cross-grating structure with known slow convergence.

Paper Details

Date Published: 21 April 2016
PDF: 10 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977805 (21 April 2016); doi: 10.1117/12.2219270
Show Author Affiliations
Samuel O'Mullane, SUNY Polytechnic Institute (United States)
Nick Keller, Nanometrics Inc. (United States)
Alain C. Diebold, SUNY Polytechnic Institute (United States)


Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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