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Proceedings Paper

Actinic review of EUV masks: performance data and status of the AIMS EUV System
Author(s): Dirk Hellweg; Sascha Perlitz; Krister Magnusson; Renzo Capelli; Markus Koch; Matt Malloy
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Paper Abstract

The EUV mask infrastructure is of key importance for the successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. ZEISS and the SUNY POLY SEMATECH EUVL Mask Infrastructure consortium started a development program for such an EUV aerial image metrology system, the AIMS EUV. In this paper, we provide measurement data on the system’s key specifications and discuss its performance and capability status.

Paper Details

Date Published: 18 March 2016
PDF: 8 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761A (18 March 2016); doi: 10.1117/12.2219247
Show Author Affiliations
Dirk Hellweg, Carl Zeiss SMT GmbH (Germany)
Sascha Perlitz, Carl Zeiss SMT GmbH (Germany)
Krister Magnusson, Carl Zeiss SMT GmbH (Germany)
Renzo Capelli, Carl Zeiss SMT GmbH (Germany)
Markus Koch, Carl Zeiss SMT GmbH (Germany)
Matt Malloy, SUNY Poly SEMATECH (United States)

Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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