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Proceedings Paper

Spin-on-carbon hard masks utilising fullerene derivatives
Author(s): Alan G. Brown; Andreas Frommhold; Tom Lada; J. Bowen; Z. el Otell; Alex P. G. Robinson
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Paper Abstract

We have developed a range of fullerene containing materials for use as organic hard masks. Recent advances in material development are reported together with some results from external evaluations of the original HM100 series. Initial results for the new HM340-383-010 formulation show it to have a high thermal stability (~5.5 % mass loss at 400°C) and a very high carbon content (at 95.3%), offering high etch durability.

Paper Details

Date Published: 25 March 2016
PDF: 8 pages
Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977927 (25 March 2016); doi: 10.1117/12.2219212
Show Author Affiliations
Alan G. Brown, Irresistible Materials Ltd. (United Kingdom)
Andreas Frommhold, Univ. of Birmingham (United Kingdom)
Tom Lada, Nano-C Inc. (United Kingdom)
J. Bowen, The Open Univ. (United Kingdom)
Z. el Otell, IMEC (Belgium)
Alex P. G. Robinson, Univ. of Birmingham (United Kingdom)


Published in SPIE Proceedings Vol. 9779:
Advances in Patterning Materials and Processes XXXIII
Christoph K. Hohle; Rick Uchida, Editor(s)

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